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- Commodity name: High precision development line
Inner des line designed by our company; Development + vacuum precision etching + high-voltage film removal line, realizing automatic connection. High precision vacuum etching, with an etching factor of 4.5, uniformity of 95%, plate thickness of 0.05~3.2mm, and line width of 2mil/2mil. It is equipped with an automatic adding system imported from Japan to monitor each section of liquid medicine and realize automatic pressure adjustment and monitoring for development, etching and film removal. The automation ability and unmanned degree are greatly improved. Suitable for HDI, high-density multilayer, packaging substrate, etc.
Inner des line designed by our company; Development + vacuum precision etching + high-voltage film removal line, realizing automatic connection. High precision vacuum etching, with an etching factor of 4.5, uniformity of 95%, plate thickness of 0.05~3.2mm, and line width of 2mil/2mil. It is equipped with an automatic adding system imported from Japan to monitor each section of liquid medicine and realize automatic pressure adjustment and monitoring for development, etching and film removal. The automation ability and unmanned degree are greatly improved. Suitable for HDI, high-density multilayer, packaging substrate, etc.
Key words:- 高精密显影线
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